Academics
follow us
  • Linkedin
  • Twitter
  • Facebook
  • Youtube
  • Instagram
Feedback
Patent Number:- IN432422

A Chemical Solution Deposition System and Method for Practical Device Applications

  • Sector: Chemical Engineering,
  • IPC: C01G, C23C, H01L,
 

Need

High-end device fabrication techniques yield efficient device performance but lack economic feasibility, necessitating a chemical solution deposition system for practical applications.

Solution

The invention aims to provide a chemical solution deposition system and method for depositing highly crystalline BiFeO3 thin films.

Innovation

Developing a chemical solution deposition system involving precise dissolution and mixing of bismuth nitrate pentahydrate and iron nitrate nonahydrate in a mixed solvent, followed by controlled aging, deposition, pre-firing, and annealing processes to fabricate thin-film devices efficiently.

Market Analysis


Market: Renewable energy technology

CAGR: Reflective of growth in renewable energy sector (e.g., 8-10%)

Potential Indian Clients: Solar energy companies, research institutions, renewable energy startups

Why Invest?


Chemical solution deposition

Thin-film

Photovoltaic (PV) technology

Ferroelectric photovoltaic effect (FEPV)

At a Glance


Current TRL: NA

Funded by: NA

IPC: C01G, C23C, H01L

Domain: Chemical System

For more information, reach out to Mr. Rajneesh Kumar, Head of the Technology Transfer Office, at tto@bits-pilani.ac.in and 01596-255515.