A Chemical Solution Deposition System and Method for Practical Device Applications
Inventors:
Prof. Kannan Ramaswamy , Waseem Ahmad Wani, Prof. B. Harihara Venkataraman
High-end device fabrication techniques yield efficient device performance but lack economic feasibility, necessitating a chemical solution deposition system for practical applications.
The invention aims to provide a chemical solution deposition system and method for depositing highly crystalline BiFeO3 thin films.
Developing a chemical solution deposition system involving precise dissolution and mixing of bismuth nitrate pentahydrate and iron nitrate nonahydrate in a mixed solvent, followed by controlled aging, deposition, pre-firing, and annealing processes to fabricate thin-film devices efficiently.
Potential Indian Clients: Solar energy companies, research institutions, renewable energy startups
Current TRL: NA
Funded by: NA
IPC: C01G, C23C, H01L
Domain: Chemical System
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